×
模态框（Modal）标题
在这里添加一些文本
Close
Close
Submit
Cancel
Confirm
×
模态框（Modal）标题
在这里添加一些文本
Close
导航切换
Progress in Physics
Home
About Journal
About Journal
Peer Review Process
Open Access Policy
Editorial Board
Guide to Authors
Ethcis Statement
Journal Online
Current Issue
Online First
Archive
Top Downloaded
Top Read
Top Cited
E-mail Alter
Subscribe
Download
Contacts us
中文
Antiferroelectric thin film materials: research status and application prospects
MA Xingjian , HUANG Xinmiao , LI Weiwei
Progress in Physics . 2026, (
4
): 174 -201 . DOI: 10.13725/j.cnki.pip.2026.04.002
